Perlakuan Panas Ganda pada Fabrikasi Film Tipis AZO Nanokristal dengan Teknik Spray : Studi XRD [Double Heat Treatments On The Fabrication Of Nanocrystalline Azo Thin Films By Spray Technique: XRD Studies]

Didik Aryanto, Naimatul Husniya, Toto Sudiro, Ema Hastuti

Abstract

XRD characterization was used to study the effect of single and double thermal treatment on the fabrication of nanocrystalline Al-doped ZnO (AZO) thin films deposited by spray technique. In the single thermal treatment, nanocrystalline AZO thin film with a wurtzite hexagonal polycrystalline structure was formed at temperatures of 500 °C and 60°C. An increasing of treatment temperature led to the increase of crystalline size and the decrease of dislocation density.  The double thermal treatment on nanocrystalline AZO thin films resulted in a small change in diffraction pattern. This indicated that the crystal parameters of nanocrystalline AZO thin films changed after receiving a second thermal treatment. Nanocrystalline AZO thin films which was thermal treatment at temperatures of 500 °C in air environment and continued at temperatures of 600 °C in vacuum showed that the decrease of average crystal size and the presence of crystal defect (an increase of strain and dislocation). Different results were shown in the nanocrystalline AZO thin film after thermal treatment attemperatures of 600 °C in air environment then followed by vacuum condition. The crystal quality of nanocrystalline AZO thin films was improved, which was indicated by an increase of the average crystal size and reduce of the strain value and dislocation density. Based on the obtainedresults, the double heat treatment effected the crystal parameter and the quality of nanocrystalline AZO thin films deposited by spray technique.

Abstrak

Karakterisasi XRD telah digunakan untuk mempelajari efek perlakuan panas tunggal dan ganda pada fabrikasi film tipis ZnO doping Al (AZO) nanokristal yang dideposisikan dengan teknik spray. Pada perlakuan panas tunggal, film tipis AZO nanokristal dengan struktur polikristal heksagonal wurtzite terbentuk pada suhu 500 °C dan 600 °C. Peningkatan suhu menyebabkan peningkatan ukuran kristal dan pengurangan kerapatan dislokasi. Perlakuan panas ganda pada film tipis AZO nanokristal mengakibatkan perubahan kecil pola difraksi. Hal ini mengindikasikan bahwa parameter kristal film tipis AZO nanokristal berubah setelah mendapat perlakuan panas kedua. Film tipis AZO nanokristal yang diberikan perlakuan panas pada suhu 500 °C dalam lingkungan udara dan dilanjutkan hingga suhu 600 °C dalam kondisi vakum memperlihatkan bahwa rata-rata ukuran kristal berkurang dan muncul cacat kristal (regangan dan kerapatan dislokasi meningkat). Hasil yang berbeda ditunjukkan pada film tipis AZO nanokristal yang diberikan perlakuan panas pada suhu 600 °C dalam lingkungan udara kemudian dilanjutkan dengan suasana vakum. Kualitas kristal film tipis AZO nanokristal meningkat, yang diindikasikan dengan peningkatan rata-rata ukuran kristal, berkurangnya nilai regangan dan kerapatan dislokasi. Berdasarkan pada hasil yang didapat, perlakuan panas ganda berpengaruh pada parameter dan kualitas kristal film tipis AZO nanokristal yang dideposisikan dengan teknik spray.

Keywords

Film tipis AZO; perlakuan panas; struktur kristal; XRD; AZO thin film; thermal treatment; crystal structure

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